[3Ba01-12] スパッタリングおよびプラズマプロセス技術部会「スパッタ・プラズマで切り拓くナノ構造の世界」

[3Ba10] Low temperature growth of LiCoO₂ thin films by ion beam assisted deposition

*Iwao Kawayama¹, Kazuki Ohta¹, Riki Kataoka², Yasushi Maeda², Toshiya Doi¹ (1. Graduate School of Energy Science, Kyoto University, 2. National Institute of Advanced Industrial Science and Technology)

We have attempted to introduce the ion beam assisted deposition (IBAD) method to prepare LCO thin films at low temperatures and succeeded in crystallizing LCO thin films on Al substrates at a substrate temperature of less than 100 °C. Moreover, charge/discharge tests for LCO films on the aluminum substrates showed voltage plateaus of about 3.6 ~ 3.8 V which is typical characteristics of LCO cathodes.