2021年日本表面真空学会学術講演会

Presentation information

Poster (core time)

[3P01-27] Poster

Fri. Nov 5, 2021 1:30 PM - 3:30 PM P会場 (P会場)

座長
13:30-14:30 一ノ倉聖(東工大)
14:30-15:30 土師将裕(東大)

[3P22] Properties of Mg-CF4 and Mg-O2 direct current reactive sputtering discharges

*Takayuki Takizawa1, Eiji Kusano1 (1. Kanazawa Institute of Technology)

Probe voltage-current curves in Mg-CF4 and Mg-O2 reactive sputtering direct current discharges were measured to analyze discharge characteristics. In Mg–CF4 discharge, the plasma potential became negative relative to the ground potential and, in the Mg–O2 discharge, the plasma potential was approximately the same as the ground potential. The changes in the plasma potential of the discharges were explained by the mechanisms to maintain the direct discharge current between the plasma bulk and the ground electrode by negative ions or electrons. The characteristics of the electro-negative discharge were clarified by comparing the Mg–CF4 discharge with the Mg–O2 discharge.