Aluminum Ratios Influence on Properties of Zinc Oxide Film Deposited by Mist Chemical Vapor Deposition Method

HTET SU WAI

講演情報

Oral Session

D. Frontiers of Advanced Electronic Materials » [D-2] Frontier in Functional Oxides and Related Materials: from Materials Design to Device Applications

[D2-O8] Slot 08

2021年12月16日(木) 09:00 〜 12:00 Room A (G401)

Chair: Hiroshi Yanagi (University of Yamanashi, JAPAN), Hui Ye (College of Optical Science and Engineering, Zhejiang University, China)

11:20 〜 11:35

[D2-O8-07] Aluminum Ratios Influence on Properties of Zinc Oxide Film Deposited by Mist Chemical Vapor Deposition Method

*HTET SU WAI¹ (1. Kochi Univ. of Tech. (Japan))

キーワード：Aluminum ratios, ZnO film, Mist CVD method, Photocatalytic property

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