Materials Research Meeting 2021

講演情報

Poster Session

D. Frontiers of Advanced Electronic Materials » [D-2] Frontier in Functional Oxides and Related Materials: from Materials Design to Device Applications

[D2-PR14] Slot 14

2021年12月14日(火) 16:00 〜 18:00 D2-PR14 (G403-404)

16:00 〜 18:00

[D2-PR14-20] Density and thermal conductivity of amorphous Al2O3 films deposited by rf magnetron sputtering under the total gas pressure from 0.5 to 8.0 Pa

*Naoki Noda1, Chinami Abe1, Makoto Kashiwagi1,2, Yuichiro Yamashita1,3, Takashi Yagi1,3, Junjun Jia4, Naoyuki Taketoshi1,3, Yuki Oguchi1, Yuzo Shigesato1 (1. Aoyama Gakuin Univ. (Japan), 2. Japan Science and Technology Agency (Japan), 3. National Institute of Advanced Industrial Science and Technology (AIST) (Japan), 4. Waseda Univ. (Japan))

キーワード:thermal conductivity, density, amorphous, thin film, Al2O3, rf magnetron sputtering

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