Amorphous WO<sub>3</sub> Electrochromic Films with controlled high-rate deposition by Reactive-gas-flow sputter deposition

Nobuto Oka

講演情報

Poster Session

D. Frontiers of Advanced Electronic Materials » [D-2] Frontier in Functional Oxides and Related Materials: from Materials Design to Device Applications

[D2-PR14] Slot 14

2021年12月14日(火) 16:00 〜 18:00 D2-PR14 (G403-404)

16:00 〜 18:00

[D2-PR14-32] Amorphous WO₃ Electrochromic Films with controlled high-rate deposition by Reactive-gas-flow sputter deposition

*Nobuto Oka^1,2, Masahiro Watanabe², Junjun Jia^2,3, Yuzo Shigesato² (1. Kindai Univ. (Japan), 2. Aoyama Gakuin Univ. (Japan), 3. Waseda Univ. (Japan))

キーワード：electrochromic films, amorphous WO3, high-rate deposition, sputtering

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講演情報

[D2-PR14] Slot 14

[D2-PR14-32] Amorphous WO3 Electrochromic Films with controlled high-rate deposition by Reactive-gas-flow sputter deposition

[D2-PR14-32] Amorphous WO₃ Electrochromic Films with controlled high-rate deposition by Reactive-gas-flow sputter deposition