[H2-PR18] Slot 18

[H2-PR18-05] Developing Prediction of Key Process Parameters of Plasma CVD for Fabricating a-Si:H Solar Cells through Boosting Technique

*Feiyu Chen¹, Kunihiro Kamataki¹, Yang Tao¹, Sakyo Okunaga¹, Daisuke Yamashita¹, Takamasa Okumura¹, Naho Itagaki¹, Kazunori Koga^1,2, Masaharu Shiratani¹ (1. Kyushu University (Japan), 2. NINS (Japan))

キーワード：machine learning, gradient boosting, plasma CVD, a-Si:H solar cell