Materials Research Meeting 2021

講演情報

Poster Session

H. Innovative Materials Processing for Sustainable Society » [H-2] Plasma-Based Synthesis, Processing and Characterization of Materials for Energy and Environment

[H2-PR18] Slot 18

2021年12月16日(木) 18:30 〜 20:30 H2-PR18 (G403-404)

18:30 〜 20:30

[H2-PR18-17] Structural Analysis of Hydrogenated Amorphous Carbon Films Deposited by Capacitively Coupled Plasma Chemical Vapor Deposition

*Shinjiro Ono1, Sung Hwa Hwang1, Takamasa Okumura1, Kunihiro Kamataki1, Naho Itagaki1, Kazunori Koga1,2, Jun Seok Oh3, Susumu Takabayashi4, Tatsuyuki Nakatani5, Masaharu Shiratani1 (1. Kyushu Univ. (Japan), 2. National Institutes of Natural Sciences (Japan), 3. Osaka City Univ. (Japan), 4. National Institute of Technology, Ariake College (Japan), 5. Okayama University of Science (Japan))

キーワード:DLC, Plasma, CVD, Raman

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