[AMDp1-5] Selective Doping in Drain Region of Amorphous Oxide Thin-Film Transistor by Electrical Stress under Illumination
oxide semiconductor, thin film transistor, bias stress
A unique method to enhance the electrical performance of oxide thin film transistor(TFT) is presented. Photo-induced holes and positively charged oxygen vacancies are attracted to near the drain terminal by applying negative bias to gate and drain electrode under illumination. These positive charges gather electrons to form n+ doped region and thus lower the parasitic resistance. The field-effect mobility increased up to 80% via this...