The Japan Society of Applied Physics

17:15 〜 17:30

[A-6-05] Millisecond Post Deposition Annealing for Improving the EOT and Dit in TiN/HfO2/SiO2/Si Gate Stacks using Flash Lamp Annealing

〇Hikaru Kawarazaki1, Akitsugu Ueda1, Shinichi Kato1, Kento Izumi2, Yasuo Nara2 (1. SCREEN Semiconductor Solutions Co., Ltd.(Japan), 2. Univ. of Hyogo(Japan))

https://doi.org/10.7567/SSDM.2020.A-6-05