The Japan Society of Applied Physics

16:15 〜 16:30

[B-2-02] Resistive switching in two-terminal HfO2/SiO2 stack with interface dipole modulation

〇Noriyuki - Miyata1, Kyoko Sumita1, Akira Yasui2, Reito Wada3, Hiroshi Nohira3 (1. AIST(Japan), 2. JASRI(Japan), 3. Tokyo City University(Japan))

https://doi.org/10.7567/SSDM.2020.B-2-02