The Japan Society of Applied Physics

16:45 〜 17:00

[H-2-03] Important of MoS2-Compound Sputtering even with Sulfur-Vapor Anneal for Chip-Size Fabrication

〇Shinya - Imai1, Takuya - Hamada1, Masaya - Hamada1, Takanori - Shirokura1, Iriya - Muneta1, Kuniyuki - Kakushima1, Tetsuya - Tatsumi1, Shigetaka - Tomiya1, Kazuo - Tsutsui 1, Hitoshi Wakabayashi1 (1. Tokyo Tech(Japan))

https://doi.org/10.7567/SSDM.2020.H-2-03