The Japan Society of Applied Physics

17:15 〜 17:30

[J-6-05] Enhanced Electrical Performance and Reliability of Ti-SZTO Thin-Film Transistors with Hf1-xSixO2 Gate Dielectrics Using Co-sputtering Technique<gdiv></gdiv>

〇Chen-En Lin1, Shui-Jinn Wang1, Rong-Ming Ko2 (1. Inst. of Microelectronics, Dept. of Electrical Engineering, National Cheng Kung University(Taiwan), 2. College of Electrical Engineering and Computer Science, National Cheng Kung University(Taiwan))

https://doi.org/10.7567/SSDM.2020.J-6-05