[20a-A8-1~12] 5.3 Optical Control

Fri. Sep 20, 2013 9:00 AM - 12:00 PM A8 (TC1 2F-232)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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9:00 AM - 9:15 AM

[20a-A8-1] Photonic crystals composed of β-FeSi₂ with amorphous Si clad

^○Hiroki Tokushige¹, Takashi Endo¹, Keita Hiidome¹, Kenta Saiki¹, Naoki Ikeda², Yoshimasa Sugimoto² (Univ. of Fukui¹, NIMS²)

9:15 AM - 9:30 AM

[20a-A8-2] Vertically-Curved Silicon Waveguide using Ion-Implantation Method

^○Tomoya Yoshida¹, Ryohei Takei¹, Takashi Nishi¹, Syougo Tajima², Masao Suzuki¹, Emiko Omoda¹, Masayoshi Nagao¹, Noboru Miura², Masahiko Mori¹, Youichi Sakakibara¹ (AIST¹, Meiji Univ.²)

9:30 AM - 9:45 AM

△ [20a-A8-3] Effect of half-tone mask for Si-wire waveguide Fabricated on 300 mm SOI Wafer

^○Shu Hirano¹, Munetoshi Soma¹, Tomohiro Kita¹, Yuichiro Tanushi¹, Miyoshi Seki², Munehiro Toyama², Tsuyoshi Horikawa², Hirohito Yamada¹ (Tohoku Univ.¹, AIST²)

9:45 AM - 10:00 AM

△ [20a-A8-4] Characteristics Uniformity of Ring Resonators Fabricated on 300 mm SOI Wafer

^○Munetoshi Soma¹, Shu Hirano¹, Yuichiro Tanushi¹, Tomohiro Kita¹, Munehiro Toyama², Tsukuru Sano², Tsuyoshi Horikawa², Hirohito Yamada¹ (Tohoku Univ.¹, AIST²)

10:00 AM - 10:15 AM

▲ [20a-A8-5] A non-damage method for the detection of the fabrication errors of microring resonators

^○(PC)Jingnan Cai¹, Shinya Takita¹, Yasuhiko Ishikawa¹, Kazumi Wada¹ (Univ. of Tokyo¹)

10:15 AM - 10:30 AM

△ [20a-A8-6] Decreasing the Insertion Loss of Wavelength-Selective Switch for On-chip Optical Network

^○Kengo Mura¹, Yuya Shoji¹, Tetsuya Mizumoto¹ (Tokyo Tech.¹)

10:30 AM - 10:45 AM

[20a-A8-7] Q factor variation by single-layer graphene integration on silicon ring resonator

^○Rai Kou^1,2,4, Shinichi Tanabe³, Tai Tsuchizawa^1,2, Tsuyoshi Yamamoto², Hiroki Hibino³, Hirochika Nakajima⁴, Koji Yamada^1,2 (NTT Nanophotonics Center¹, NTT Microsystem Integration Labs.², NTT Basic Research Labs.³, Waseda Univ.⁴)

10:45 AM - 11:00 AM

[20a-A8-8] Si Taper-SSC with Large Fabrication Tolerance due to Optical Mode Control by using SiOx Thin Film Slab Waveguide

^○Hiroyuki Takahashi^1,2, Nobuaki Hatori^1,2, Takanori Shimizu^1,2, Masashige Ishizaka^1,2, Makoto Okano^1,3, Tsuyoshi Horikawa^1,3 (PECST¹, PETRA², AIST³)

11:00 AM - 11:15 AM

[20a-A8-9] Low-Loss Optical Interlayer Coupler for Three-Dimensional On-Chip Optical Interconnect

^○Ryohei Takei^1,2, Emiko Omoda^1,2, Masao Suzuki^1,2, Shoko Manako^1,2, Toshihiro Kamei^1,2, Masahiko Mori^1,2, Youichi Sakakibara^1,2 (AIST¹, PECST²)

11:15 AM - 11:30 AM

[20a-A8-10] Silicon waveguide optical isolator with over 20 dB isolation for 8 nm bandwidth

^○Yuya Shoji¹, Yuya Shirato¹, Tetsuya Mizumoto¹ (Tokyo Tech¹)

11:30 AM - 11:45 AM

[20a-A8-11] Study of CoFe₂O₄ for an Ultra-compact Magneto-Optical Isolator on Si Photonics Circuits

^○Megumi Yanaga¹, Yuya Shoji¹, Takao Kashima¹, Takahiro Suzuki¹, Shigeki Nakagawa¹, Tetsuya Mizumoto¹ (Tokyo Tech¹)

11:45 AM - 12:00 PM

[20a-A8-12] TE-TM mode converter based on asymmetric slit Si waveguide

^○Akihiro Fujie¹, Yuya Shoji¹, tetsuya Mizumoto¹ (Tokyo Inst.¹)