Formation and Characterization of a Three Dimensional Silicon Quantum Dot Superlattice Fabricated by Top-Down Process Using Bio-Template and Neutral Beam Etching Technology for its Application to a High Efficiency Quantum Dot Solar Cell

11:00 〜 11:15

▼ [18a-D6-6] Formation and Characterization of a Three Dimensional Silicon Quantum Dot Superlattice Fabricated by Top-Down Process Using Bio-Template and Neutral Beam Etching Technology for its Application to a High Efficiency Quantum Dot Solar Cell

^○Mohammad Rahman^1,4，五十嵐誠^1,4，胡衛国^1,4，Mohd Erman Fauzi^1,4，星裕介²，宇佐美徳隆²，寒川誠二^1,3,4 (東北大流体研¹，名大院工²，東北大WPI-AIMR³，JST-CREST⁴)

キーワード：シリコン量子ドット太陽電池,ミニバンド,3次元ナノディスクアレイ