[30a-G7-1~10] 14.1 Physical properties of exploratory materials

[30a-G7-2] Preparation of epitaxial Mg₂Si films by sputtering method

^○Atsuo Katagiri¹, Shota Ogawa¹, Masaaki Matsushima¹, Kensuke Akiyama^1,2, Hiroshi Funakubo¹ (Tokyo Tech¹, Kanagawaken Industrial Technology Center²)

Keywords:薄膜、熱電材料、スパッタリング法