4:00 PM - 4:30 PM
[13p-4C-8] Trends in Developing Ge-CMOS Integration Technologies
Keywords:germanium,CMOS,MOSFET
Ge transistors are expected to be introduced in the 7-nm technology node and beyond. How to integrate Ge devices on a Si CMOS platform is one of the most significant issues because it will be the first time that non-Si MOSFETs are implemented in scaled CMOS technologies. In this presentation, various integration schemes are reviewed with our recent results on Ge-CMOS.