The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

[15p-1A-1~14] 15.6 Group IV Compound Semiconductors (SiC)

Tue. Sep 15, 2015 1:30 PM - 5:30 PM 1A (131+132)

座長:黒木 伸一郎(広島大),升本 恵子(産総研)

4:00 PM - 4:15 PM

[15p-1A-9] Noncontact and nondestructive measurement of electrical properties for SiC film using THz ellipsometry

〇Takashi Fujii1,2, Iwamoto Toshiyuki1, Sato Yukinori1, Tachi Kohei2, Araki Tsutomu2, Nanishi Yasushi2, Sugie Ryuichi3, Morita Noayoshi3, Nagashima Takeshi4 (1.PNP, 2.Ritsumeikan Univ., 3.TRC, 4.Setsunan Univ.)

Keywords:SiC,THz,ellipsometory

We have proposed THz ellipsometory due to noncontact and nondestructive measurement for electrical properties of semiconductor materials. In this report, we measured 5 kinds of carrier concentrations (1E15 - 1E17cm-3)of SiC films (about 10um) on SiC substrate using THz ellipsometory. Furthermore, the carrier concentratins of these films also were measured using CV method. As a results, the carrier concentrations by THz ellipsometry were slighty less than those by CV method. The relationship between the THz ellipsometory and CV method correspond to those between Hall and CV method. We expect that it is posible to measure around1014cm-3 of the carrier concentration using THz ellipsometory.