[13a-A27-1~13] 8.3 deposition of thin film and surface treatment

[13a-A27-5] Sputtering Deposition using a Ti Powder Targets of Different Particle Sizes

〇Tamiko Ooshima¹, Takashi Maeda¹, Yuki Tanaka¹, Hiroharu Kawasaki¹, Yoshihito Yagyu¹, Takeshi Ihara¹, Yoshiaki Suda¹ (1.Nat.Inst.of Tech.,Sasebo Col.)

Keywords:sputtering,powder target