[19p-W621-1~12] 8.4 Plasma etching

[19p-W621-1] Transport mechanism on reactive species in down-flow reactors for F-based Si etch

〇Kenji Ishikawa¹, Makoto Sekine¹, Toshio Hayashi¹, Masaru Hori¹, Yasuhiro Horiike² (1.Nagoya University, 2.Tsukuba University)

Keywords:Chemical dry etching,Perocy radical

Effects of oxygen addition into fluorine-base plasma chemistry were sudied on the basis of formation of fluorine peroxy radicals.