2016年第63回応用物理学会春季学術講演会

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一般セッション(口頭講演)

6 薄膜・表面 » 6.4 薄膜新材料

[21p-H103-1~21] 6.4 薄膜新材料

2016年3月21日(月) 13:15 〜 19:00 H103 (本館)

遠藤 民生(岐阜大)、名村 今日子(京大)、永田 知子(日大)

14:30 〜 14:45

[21p-H103-6] Controlling material ratio and gradient of mixed lead halide films for tandem solar cell fabrication

〇(D)Stecker Chandler Collin1、Ono Luis K.1、Qi Yabing1 (1.OIST)

キーワード:photovoltaics,perovskite,thin film

Organo-lead-halide perovskite (OHP) materials have received much attention recently in the solar cell field due to their exceptional light absorbing properties and low cost. Mixing different perovskite materials allows for band gap tuning, enabling optimal utilization of the solar spectrum. However, few studies utilize the vacuum deposition to fabricate mixed halide perovskite films. A home-designed hybrid deposition system that provides excellent control of layer thickness and material ratio has been used for creating non-mixed MAPbI3 film based devices.[1] Here, we further explore the potential of the vacuum deposition technique to create films of mixed halide perovskite, MAPb(IxBr1-x)3 with controlled and varying ratios, which could be beneficial in the creation of a tandem perovskite solar cell. Film morphology and characterization of precursor mixed lead halide films are explored and performance of an initial test device using methyl amine gas-induced perovskite growth (MAGIC) technique [2] will be discussed.