The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[21p-H111-1~22] 6.3 Oxide electronics

Mon. Mar 21, 2016 1:00 PM - 6:45 PM H111 (H)

Hisashi Shima(AIST), Yasuhisa Naitoh(AIST)

2:00 PM - 2:15 PM

[21p-H111-5] Impacts of Carrier Energy on Resistive Transition of Sputter-Deposition SiO2 Films

Rintaro Yamaguchi1, Shingo Sato1, Yasuhisa Omura1 (1.Kansai Univ.)

Keywords:SiO2,resistive transition,hot electron

Hitherto, it was considered that the SiO2 film was not appropriate for the resistive transition phenomena. In this paper, however, we demonstrate the important fact revealing that the hot-electron injection plays an important role to assist the resistive transition.