The 63rd JSAP Spring Meeting, 2016

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8 Plasma Electronics » 8.3 Deposition of thin film and surface treatment

[22a-W611-1~14] 8.3 Deposition of thin film and surface treatment

Tue. Mar 22, 2016 9:00 AM - 12:45 PM W611 (W6)

Jaeho Kim(AIST)

12:30 PM - 12:45 PM

[22a-W611-14] Sputtering Deposition of AZO Using the Mixed Powder Targets

〇Tamiko Ooshima1, Hiroharu Kawasaki1, Yoshihito Yagyu1, Takeshi Ihara1, Yoshiaki Suda1 (1.Natl. Inst. Tech. Sasebo Col.)

Keywords:sputtering,powder target