[18a-234A-1~5] 8.6 Plasma Electronics English Session

▼ [18a-234A-2] Influence of gas flow rate on deposition of carbon nanoparticles produced by CH₄+Ar multi-hollow discharge plasma onto substrates

〇SungHwa Hwang¹、Kunihiro Kamataki¹、Naho Itagaki¹、Kazunori Koga¹、Masaharu Shiratani¹ (1.Kyushu Univ)

キーワード：plasma, carbon nano particles

Carbon nano material has been used in a range of research fields due to its extensive characteristics. In particular, reproducibility and uniformity of carbon materials are considered as the main issues of their application. In this study, we synthesize carbon nano particles by using methane plasma process at different gas conditions. In addition, we investigate the deposition on substrate following the particle size and gas flow.