SungHwa Hwang

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Speaker, Author, Co-Author

Tue. Sep 18, 2018 9:00 AM - 10:15 AM 234A (234-1)

Oral presentation
| 8 Plasma Electronics
| 8.6 Plasma Electronics English Session

[18a-234A-1~5] 8.6 Plasma Electronics English Session

9:15 AM - 9:30 AM

▼ [18a-234A-2] Influence of gas flow rate on deposition of carbon nanoparticles produced by CH₄+Ar multi-hollow discharge plasma onto substrates

〇SungHwa Hwang¹, Kunihiro Kamataki¹, Naho Itagaki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1.Kyushu Univ)