The 79th JSAP Autumn Meeting, 2018

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6 Thin Films and Surfaces » 6.4 Thin films and New materials

[19p-234B-1~19] 6.4 Thin films and New materials

Wed. Sep 19, 2018 1:15 PM - 6:30 PM 234B (234-2)

Tetsuo Tsuchiya(AIST), Taro Hitosugi(Tokyo Tech), Yuji Muraoka(Okayama Univ.)

6:00 PM - 6:15 PM

△ [19p-234B-18] Low Refractive Index SiO2 Optical Thin Films Deposited by Sputtering and Electron Beam Evaporation (２)

〇Yoshiki Tsuno1, Kenji Masuyama1, Hiroshi Murotani1, Shigeharu Matsumoto2 (1.Grad. Sch. of Eng., Tokai Univ., 2.SHINCRON Co., Ltd.)

Keywords:optical thin film, low refractive index, silicon dioxide