[18p-PB5-1~36] 21.1 合同セッションＫ 「ワイドギャップ酸化物半導体材料・デバイス」

▲ [18p-PB5-31] Fabrication of (001)-Sn₅P₂O₁₀ thin films on quartz by inserting Y₂O₃ buffer layer

〇Michitaka Fukumoto^1,2、Chang Yang^1,3、Wenlei Yu¹、Christian Patzig⁴、Thomas Hoeche⁴、Tetsuya Hasegawa²、Michael Lorenz¹、Marius Grundmann¹ (1.Leipzig Univ.、2.Univ. of Tokyo、3.Wenzhou Medical Univ.、4.Fraunhofer IMWS)

キーワード：transparent conductive oxides, pulsed laser deposition