[16p-Z12-1~17] 8.8 Division of Plasma Electronics 30th Anniversary Special Session

[16p-Z12-12] Low Temperature Plasma CVD of SiNx by Incorporating Nano Particles

〇(M2)Yusuke Sasaki¹, Tomoaki Yoshida¹, Kouhei Abe¹, Koudai Yamamoto¹, Kunihiro Kamataki¹, Takamasa Okumura¹, Naho Itagaki¹, Kazunori Koga^1,2, Masaharu Shiratani¹ (1.Kyushu Univ., 2.NIFS)

Keywords:plasma CVD, nano Particles, semicondutor