14:40 〜 15:10
[3Cp05] New routes towards lowering energy consumption during magnetron sputtering: benefits of high-mass metal-ion irradiation
Lowering energy consumption during thin film growth made by magnetron sputtering techniques becomes of particular importance in view of sustainable development goals. As a large fraction of the process energy is consumed for substrate heating with the purpose of providing sufficient adatom mobility to grow dense films, the most straightforward strategy towards more environment-friendly processing is to find alternatives to the thermally activated surface diffusion. A promising route is offered by high-mass metal ion irradiation from HiPIMS source, which is very effective in densification of transition metal nitride layers grown with no external heating, such that Zone 2 microstructures of the structure-zone model are obtained in the substrate temperature Ts range otherwise typical for Zone 1 growth. The major fraction of process energy is used at the sputtering sources and for film densification, rather than for heating of the entire vacuum vessel.
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