SISPAD2023

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Oral

[Session 4] Process Simulation

Wed. Sep 27, 2023 3:20 PM - 5:00 PM Hall B

Chair: Nobuhiko Nakano (Keio Univ.), Junichi Hattori (AIST)

4:20 PM - 4:40 PM

[Session_4-04] Modeling Oxide Regrowth During Selective Etching in Vertical 3D NAND Structures

*Tobias Reiter1, Alexander Toifl2, Andreas Hössinger2, Lado Filipovic1 (1. TU Wien, Inst. for Microelectronics, 2. Silvaco Europe Ltd.)

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