Large-area and phase-controlled MoTe<sub>2</sub> grown by cold-wall chemical vapor deposition on different substrates

Ping- Feng Chi

doi:https://doi.org/10.7567/SSDM.2023.PS-11-06

講演情報

Poster Session

11: Advanced Materials: Synthesis / Crystal Growth / Characterization

[PS-11] 11: Advanced Materials: Synthesis / Crystal Growth / Characterization

2023年9月7日(木) 15:00 〜 17:00 Shirotori Hall (Nagoya Congress Center)

[PS-11-06] Large-area and phase-controlled MoTe₂ grown by cold-wall chemical vapor deposition on different substrates

^○Ping- Feng Chi¹, Yung-Lan Chuang¹, Jing-Wen Zhang¹, Jing-Jie Wang¹, Zide Yu¹, Ming-Lun Lee², Jinn-Kong Sheu¹ (1. Univ. of NCKU (Taiwan), 2. Univ. of STUST (Taiwan))

https://doi.org/10.7567/SSDM.2023.PS-11-06

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講演情報

[PS-11] 11: Advanced Materials: Synthesis / Crystal Growth / Characterization

[PS-11-06] Large-area and phase-controlled MoTe2 grown by cold-wall chemical vapor deposition on different substrates

パスワード

[PS-11-06] Large-area and phase-controlled MoTe₂ grown by cold-wall chemical vapor deposition on different substrates