[B-1-2] Advanced OSELO Isolation with Shallow Grooves for Three-quarter Micron ULSIs

Toru KAGA、Yoshifumi KAWAMOTO、Shin-pei IIJIMA、Yoshimi SUDOH、Yoshio SAKAI (1.CENTRAL RESEARCH LABORATORY, HITACHI Ltd.)

https://doi.org/10.7567/SSDM.1986.B-1-2