[A-1-3] Reduction of Internal Stress by Compositional Gradient Layer Inserted between TiSi2 and Si Tomonobu HATA、Masanobu Tsuchitani、Kenji Kamiya、Susumu Horita (1.Faculty of Technology, Kanazawa University) https://doi.org/10.7567/SSDM.1989.A-1-3
