[A-4-3] Plasma Enhanced Liquid Source-CVD and Rapid Thermal Annealing of Tantalum Penta Oxide Dielectric Material

P. A. Murawala、M. Sawai、T. Tatsuta、O. Tsuji Sz. Fujita、Sg. Fujita (1.Research & Development Center, Samco International Incorporated、2.Department of Electrical Engineering, Kyoto University)

https://doi.org/10.7567/SSDM.1992.A-4-3