[PC-1-21] CVD Method of Anti-Reflective Layer Film for Excimer Laser Lithography

Tetsuo Gocho、Tohru Ogawa、Masakazu Muroyama、Jun-ich Sato (1.ULSI R&D Laboratories, SONY Corporation Atsugi Technology Center)

https://doi.org/10.7567/SSDM.1993.PC-1-21