[LD-18] ON-Current Stability of Poly-Si Thin Film Transistor with Si-rich Oxide as Intermetal Dielectric Film after Negative Bias Temperature Stress

Gug-Seon Choi, Jin-Ho Choi, Yoon-Jong Lee, Jong-Wan Nam, Sook-Rak Ma, Kyung-Sik Chang, Jong-Sub Yoon, Hee-Koo Yoon (1.Semiconductor R&D Lab. 1, Hyundai Electronics Industries Co., Ltd.)

https://doi.org/10.7567/SSDM.1994.LD-18