[PD-2-2] Study of Single Layer Thermal Oxide as Inter-Poly Dielectric for Next Generation Flash Memory

N. Shinmura、S. Sato、K. Hakozaki、K. Azuma、K. Iguchi、K. Sakiyama (1.VLSI Development Laboratories, IC Group, SHARP Corporation)

https://doi.org/10.7567/SSDM.1994.PD-2-2