[PD-1-1] Atomic Scale Oxidation Process on Hydrogen-Terminated Silicon Surface

Hiroshi NOHIRA, Yohichi OKUBE, Etsuo IIJIMA, Hiroshi YAMAMOTO, Naoto TATE, Masatake KATAYAMA, Takeo HATTORI (1.Department of Electrical and Electronic Engineering, Musashi Institute of Technology, 2.Shin-Etsu Handotai Co. Ltd.)

https://doi.org/10.7567/SSDM.1996.PD-1-1