[PD-1-5] Mechanism for Desorption of SiF4 from SiO2 Film Surface in HF Solutions

Tomoki OKU、Kazuhiko SATO、Mutsuyuki OTSUBO (1.Mitsubishi Electric Corporation Optoelectronic and Microwave Devices Laboratory)

https://doi.org/10.7567/SSDM.1996.PD-1-5