[B-12-2] A Reliable Interconnection Technology Using Organic Low-K Dielectrics for 0.18 μm CMOS Circuit

Kazuhiko Tokunaga、Koichi Ikeda、Takaaki Miyamoto、Toshiaki Hasegawa、Masanaga Fukasawa、Hideyuki Kito、Shingo Kadomura (1.Process Development Dept.2, LSI Business & Technology Development Group, C.N.C., Sony Corporation)

https://doi.org/10.7567/SSDM.1999.B-12-2