[A-7-6] The Formation of High Temperature Stable Co-Silicide from Co1-xTax/Si Systems

Deok-Hyung Lee、Dae-Hong Ko、Hyo-Jick Choi、Ja-Hum Ku、Siyoung Choi、Kazuyuki Fujihara、Ho-Kyu Kang Sang-Ho Oh、Chan-Gyung Park、Hoo-Jeung Lee (1.Department of Ceramic Engineering, Yonsei University、2.Process Development Team Semiconductor R&D Division Samsung Electronics Co.、3.Pohang University of Science and Technology (POSTECH)、4.Stanford University)

https://doi.org/10.7567/SSDM.2000.A-7-6