The Japan Society of Applied Physics

[B-1-3] The Impact for Gate Oxide Scaling (32A-12A) and Power Supply for Sub-0.1 μm CMOSFETs

W. K. Yeh、C. Y. Lin、S. M. Cheng、C. T. Huang、H. H. Shih、J. K. Chen、F. T. Liou (1.United Microelectronics Corp., Logic Technology Department, Technology & Process Development Division)

https://doi.org/10.7567/SSDM.2000.B-1-3