[B-6-4] Suppression of Gate Depletion in p+ Polysilicon Gated Sub-40nm PMOS Devices by Laser Thermal Process
T. Yamamoto、T. Kubo、K. Okabe、T. Sukegawa、Y. Wang、T. Lin、S. Talwar、M. Kase
(1.Fujitsu Ltd.、2.Ultratech Inc.)
https://doi.org/10.7567/SSDM.2004.B-6-4
