[P3-18] Design and Fabrication of MOS Device Circuits with Reticle-Free Exposure Method

Katsuhiko Wakasugi、Satoshi Wakimoto、Akira Nakada、Ichiro Ohshima、Hiroshi Kubota、Kazumitsu Nakamura (1.Graduate School of Science and Technology, Kumamoto University、2.Kumamoto Technology and Industry Foundation)

https://doi.org/10.7567/SSDM.2004.P3-18