[P3-11] Carrier Mobility in Multi-FinFETs with a (111) Channel Surface Fabricated by Orientation-Dependent Wet Etching

Y. X. Liu、E. Sugimata、K. Ishii、M. Masahara、K. Endo、T. Matsukawa、H. Takashima、H. Yamauchi、E. Suzuki (1.National Institute of Advanced Industrial Science and Technology (AIST))

https://doi.org/10.7567/SSDM.2005.P3-11