[J-9-1] Degradation and Breakdown of Sub-1nm EOT HfO2/Metal Gate Stacks

G. Groeseneken, R. Degraeve, T. Kauerauf, M. Cho, M. Zahid, L-A. Ragnarsson, D. P. Brunco, B. Kaczer, Ph. Roussel, S De Gendt (1.IMEC, 2.KU Leuven, 3.Seoul National University, 4.John Moores University, 5.Intel assignee at IMEC)

https://doi.org/10.7567/SSDM.2006.J-9-1