[J-9-3] Reliability of thick oxides integrated with HfSiOx gate dielectric

B. H. Lee、C. Y. Kang、T. H. Lee、J. Barnett、R. Choi、S. C. Song、R. Jammy (1.SEMATECH、2.IBM assignee、3.University of Texas at Austin)

https://doi.org/10.7567/SSDM.2006.J-9-3