[P-3-1] An Efficient Mobility Enhancement Engineering on 65nm FUSI CMOSFETs using a Second CESL Process

Chieh-Ming Lai、Yean-Kuen Fang、Chien-Ting Lin、Wen-Kuan Yeh、Chia-Wei Hsu、Che-Hua Hsu、Liang-Wei Chen、Mike Ma (1.Institute of Microelectronics, National Cheng Kung University、2.Department of Electrical Engineering, National University of Kaohsiung、3.United Microelectronics Corporation, Central R&D Division)

https://doi.org/10.7567/SSDM.2006.P-3-1