[P-2-7] Impact of film structures on damage to low-k SiOCH film during plasma exposure

S. Yasuhara¹、T. Sasaki¹、K. Tajima²、H. Yano²、S. Kadomura²、M. Yoshimaru²、N. Matsunaga²、S. Samukawa¹ (1.Tohoku Univ.(Japan)、2.STARC(Japan))

https://doi.org/10.7567/SSDM.2009.P-2-7