[B-3-3] Fermi-level Pinning and NBTI Free of CMOS HfO₂ By Pre-CF₄ Plasma Passivation

H. H. Chiu¹、C. S. Lai¹、J. C. Wang¹ (1.Chang Gung Univ. , Taiwan)

https://doi.org/10.7567/SSDM.2010.B-3-3