[P-2-4] Above-CMOS Metal-Pattern Technique for Flexible Inductance Adjustment in Rapid Prototyping of RF SoCs K. Kotani1, A. Sugimoto1, Y. Omiya1, T. Ito1 (1.Tohoku Univ. , Japan) https://doi.org/10.7567/SSDM.2010.P-2-4